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Jaeger Chapter 1

August 26, 2012 Leave a comment

This is the first post in my new category, Microelectronic Fabrication (the sub-category is VLSI). It’s a summary of the points I found interesting (read: points I am likely to forget) in the first chapter of the textbook “Introduction to Microelectronic Fabrication” by Richard C. Jaeger. The first chapter gives a brief overview of the entire subject.

Summary
– Basic processing steps:

  • Oxidation
  • Photolithography
  • Etching
  • Diffusion
  • Evaporating or sputtering
  • CVD
  • Ion implantation
  • Epitaxy
  • Annealing

– Epitaxy (I need to read more about this)
– Two beak shapes of silicon dioxide (need to find out the reason behind this)
– Understood the NMOS and CMOS processes (figures 1.4 to 1.10 provde good reference material)